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Towards a metallic top contact electrode in molecular electronic devices exhibiting a large surface coverage by photoreduction of silver cations

机译:分子电子设备中的金属顶部接触电极通过银阳离子的光还原表现出大的表面覆盖率

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摘要

In this contribution the photoreduction of silver ions coordinated onto a Langmuir-Blodgett monolayer is presented as an effective method for the deposition of the top contact electrode in metal/monolayer/metal devices. Silver cations were incorporated from an aqueous AgNO sub-phase of Langmuir films of 4,4′-(1,4-phenylenebis(ethyne-2,1-diyl))dibenzoic acid upon the transference of these films onto a metallic substrate. Subsequent irradiation of the silver-ion functionalized Langmuir-Blodgett films with 254 nm light results in the photoreduction of silver cations to produce metallic silver nanoparticles, which are distributed over the organic monolayer and exhibit a surface coverage as large as 76% of the monolayer surface. Electrical properties of these metal/monolayer/metal devices were determined by recording I-V curves, which show a sigmoidal behaviour indicative of well-behaved junctions free of metallic filaments and short-circuits. The integrity of the organic monolayer upon the irradiation process and formation of the silver top-contact electrode has also been demonstrated through cyclic voltammetry experiments.
机译:在该贡献中,提出了配位到Langmuir-Blodgett单层上的银离子的光还原,作为在金属/单层/金属器件中沉积顶部接触电极的有效方法。当这些膜转移到金属基材上时,从4,4'-(1,4-亚苯基双(乙炔-2,1-二基))二苯甲酸的Langmuir膜的AgNO水溶液亚相中引入银阳离子。随后用254 nm的光对银离子官能化的Langmuir-Blodgett膜进行辐照会导致银阳离子的光还原,从而生成金属银纳米颗粒,该金属纳米颗粒分布在有机单分子层上,表面覆盖率高达单分子层表面的76% 。这些金属/单层/金属器件的电性能是通过记录I-V曲线来确定的,该曲线显示出S型行为,表明没有金属丝和短路的行为良好的结。还已经通过循环伏安法实验证明了辐照过程中有机单层的完整性以及银顶部接触电极的形成。

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